Zeiss Auriga Laser

The Zeiss Auriga Laser system combines the advantages of the CrossBeam technology, consisting of a focused ion beam column (Orsay Physics Ga+ ion FIB) and a scanning electron column (GeminiĀ  Schottky field emission) - with the capability of fast material removal by a femtosecond pulse laser. The integrated OneFive Origami 10XP femtosecond laser produces pulses with a duration of 400 fs and a maximum average power of 4 W. Further it offers the possibility to operate at wavelengths of 1030, 515 or 343 nm.

By employing a laser for material ablation, the removal rates are orders of magnitude higher as the rates achievable with the FIB technique. While continuous and short pulse laser lead to an extended heat affected zone, ultrashort pulse laser (< picosecond) exert no thermal influence on the surrounding material. Therefore a femtosecond laser offers an ideal tool for micrometer-sized sample preparation and pre-preparation. After a fast processing of arbitrary structures with the laser, the FIB allows a precise rework. An additional capability of the FIB system is the preparation of special features, for example round micro-pillars.